The Improving Si0.5Ge0.5/Si Interface Quality through a Low Energy Hydrogen Plasma Cleaning Process and Positron Annihilation Spectroscopy. International Journal of Automation and Smart Technology, [S. l.], v. 4, n. 1, p. 21–26, 2014. DOI: 10.5875/ausmt.v4i1.234. Disponível em: https://www.jausmt.org/index.php/jausmt/article/view/336.. Acesso em: 1 may. 2026.