The Improving Si0.5Ge0.5/Si Interface Quality through a Low Energy Hydrogen Plasma Cleaning Process and Positron Annihilation Spectroscopy. JAUSMT [Internet]. 2014 Mar. 1 [cited 2026 May 1];4(1):21-6. Available from: https://www.jausmt.org/index.php/jausmt/article/view/336