Multi-sensor Approach for Multivalent Applications in Nanometrology

Abstract

The field of nanometrology is subject to increasing complexity as dimensional structures become more intricate with smaller structural widths and increasingly larger surface areas, and with the inclusion of thousands of inspection features. The relevant metrology tools thus need to provide the ability to measure in three dimensions with atomic resolution over large areas, and at a speed/throughput suitable for industrial applications. Ilmenau developed Nanopositioning and Nanomeasuring Technologies with an measuring range of tens of millimeter, subnanometer resolution and nanometer accuracy, allowing for combination with a multi-sensor approach for multivalent measurement and positioning applications in nanometrology.